Course Description
Introduction to Sputter Deposition; Important Processes to Consider:
- Ion-solid interactions on the target.
- Collisions in the gas phase – ionization, scattering.
- Nucleation and film growth on the substrate.
- Use of ion-solid interactions to modify film growth
Elements of Kinetic Theory of Gases and Plasma Physics
- Pressure of gas molecules
- Energy distributions
- Collision and mean free path
- Cold cathode discharge maintenance
- Plasma characterization by electrostatic probes
Sputtering Yield
- Linear cascade model
- Correction for threshold effects
- Sputtering efficiency
- Energy of sputtered atoms
- Ion reflection
Sputtering Systems
- Conventional diode sputtering
- Triode sputtering
- Magnetron sputtering
- Discharge characteristics
- Ion distribution at substrate
- Pulsed and High-Power Pulsed Magnetron Sputtering
- Reactive sputtering
- Independent control of ion flux and ion energy at the substrate
Who Should Attend?
Graduate students, scientists and engineers who want to learn about sputter deposition processes.
Instructor
Ivan Petrov
PhD, D.h.c., Professor
Materials Research Laboratory, Univ. of Illinois at Urbana-Champaign, USA
Department of Physics, Linköping University, Sweden
