Symposium B focuses on surface engineering and materials science of hard and protective coatings. We are interested in the fundamentals of deposition processes, properties of new single, multilayer, nanocomposite and nanostructured hard coatings, process-structure-property relationships, substrate effects, modeling, and industrial practices.
B1. PVD Coatings and Technologies
This session solicits contributions (except those covered by the topical sessions) related to sputter-deposition, cathodic and anodic arc discharges, laser ablation, electron beam (with and without additional ionization), and combinations of PVD coating methods. We welcome contributions on in-situ measurements, process modeling, plasma transport in electromagnetic fields, and multi-phase, gradient, and nanostructured coatings, as well as hard and superhard coatings. Applications include but are not limited to wear-protective coatings for components and tools, low-friction thin films, high-temperature wear-, erosion-, and corrosion-resistant coatings, optical layers, biomaterials, decorative coatings, and materials for energy applications.
B1. Invited Speakers:
- Aharon Inspektor, Carnegie Mellon University, USA, “New Challenges and Opportunities for PVD Coatings in Metal Cutting Applications”
B2. CVD Coatings and Technologies
This session solicits experts in thin films deposition techniques, involving chemical vapor deposition, for the growth of protective coatings and multifunctional, smart, or hard materials. This session will address (1) various techniques including Atmospheric Pressure CVD, LPCVD, MOCVD, ALD, HVPE, Pulsed CVD, and their plasma-assisted counterparts, PECVD and PEALD; (2) novel molecular CVD precursors or original delivery systems for low vapor pressure/difficult precursors (DLI, pressure pulse, direct halogenation) ; (3) properties of materials and structures grown by these deposition techniques; and (4) CVD modeling techniques from molecular to equipment scale.
B2. Invited Speakers:
- Georges Chollon, Laboratoire des Composites Thermostrurax, CNRS, France, “Si and SiC-based CVD Coatings for High Temperature Structural Applications”
B3. Deposition Technologies and Applications for Carbon-based Coatings
This session solicits contributions that address the application of carbon-based coatings industry. We want to span the whole range from applications for DLC or ta-C on engineering components as well as coatings employed in devices and displays or electrochemical applications like fuel cells and electrolytic applications. Deposition technologies include plasma-based methods CVD, PVD, and their combination, arc, ion-beam, and laser-assisted deposition and HIPIMS as well as dip coating, sol-gel, and other transfer techniques. This session includes fundamentals and development of interfaces between substrate and DLC to improve adhesion, supporting layers, and hybrids with hard coatings, industrial practices, scalability, and cost estimates.
B3. Invited Speaker:
- Kwang-Ryeol Lee, Korea Institute of Science and Technology, Republic of Korea, “Molecular Dynamics Study on the Interfacial Phenomena of Diamond-like Carbon Thin Film”
B4. Properties and Characterization of Hard Coatings and Surfaces
This session solicits contributions (except those covered by the topical sessions) on the relationships among composition, microstructure, and properties of hard coatings and surfaces, the effect of deposition parameters on these properties, as well as the development and use of novel characterization techniques.
B4. Invited Speakers:
- Kao-Shuo Chang, National Cheng Kung University, Taiwan , “Combinatorial Exploration of High-entropy High-dielectric-constant BaTiO3-based Films and Their Advanced Application in Metal-oxide-semiconductor-based Devices”
- Thomas Gradt, Federal Institute for Materials Research and Testing (BAM), Germany, “Amorphous Carbon Coatings for Tribological Applications in Hydrogen and Natural Gas Environments”
B5. Hard and Multifunctional Nanostructured Coatings
This session solicits contributions related to nanostructured and nanocomposite coatings as well as multi-component and layered films with morphological designs adapting the microstructure down to the nanoscale level. The desired functionalities range from structural properties such as high hardness, toughness, or thermal stability to chemical inertness up to adaptive mechanisms like controlled friction as well as sensing properties. The session not only emphasizes the design and synthesis of novel coating concepts but also their characterization, modeling, and applications. In addition, combined functionalities such as in-situ sensing of structural coatings – just to mention one possibility – are highly appreciated to explore the next level of multifunctional and smart coatings.
B5. Invited Speakers:
- Asunción Fernández, Instituto de Ciencia de Materiales de Sevilla CSIC – Univ. Sevilla, Spain, “Nanoporous/Nanocomposite Thin Films by Magnetron Sputtering Deposition in Helium: New Materials and Applications”
- Yuxiang Xu, Guangdong University of Technology, China, “High-Temperature Properties of Multicomponent Nitride Coatings Deposited by PVD”
B6. Computationally-aided Materials Design
With increasing complexity in materials and their ever growing range of applications, there is a great need to understand the material characteristics at the atomic and electronic levels. To this end, quantum mechanical and classical methods are incredibly powerful tools capable of guiding the entire design process. Tremendous improvements in computational resources, coupled with the method developments and related software implementations development in recent years, make it possible to calculate real materials properties and thus provide a roadmap for experimental materials synthesis. This session focuses on computationally-guided experimental studies and purely computational investigations. It welcomes contributions from atomistic investigations employed in materials design, including first-principles approaches, molecular dynamics, and Monte Carlo simulations. Papers are solicited on both experimental and modeling studies for, e.g.: (i) synthesis/characterization/measurements supported by predictions of material properties; (ii) atomic/electronic-scale understanding of experimental observations; (iii) identification of correlations and/or causation between atomic scale-and-macroscale properties or phenomena. Machine learning and big data approaches are also welcome in combination or substitution of more traditional atomistic methods.
B6. Invited Speakers:
- Philippe Djemia, Université Paris, France, “Computational Supports to Identify Structural and Elastic Relationship of Crystalline and Amorphous Thin Films Alloys”
- Susan B. Sinnott, The Pennsylvania State University, USA, “Investigation of Structure-Property Relationships in High-Entropy Oxides”
- Yen-Hsun Su, National Cheng Kung University, Taiwan , “Selection of Photosensitive Materials on Metal Oxide Surface by Using Machine Learning”
B7. Plasma Surface Interactions, Diagnostics, and Growth Processes
Plasma processes are at the heart of inventive deposition strategies for innovative coating materials and nanostructures with enhanced properties and/or multiple functionalities. Diagnostics based on plasma composition and in surface characterization are essential to understand the physical proprieties of the coatings and mechanisms of the plasma growth processes and plasma-surface interaction. The objective of this session is to show how such correlations could establish processing-structure-property relationships and improve the design of materials. Talks featuring new plasma diagnostic techniques, characterization of plasmas in novel processes, correlation of intrinsic plasma properties to the structure and composition of materials and deployment of artificial intelligence/machine learning/big data methods to reveal the mechanisms of plasma generation, film growth and process quality assurance are welcome.
B7. Invited Speakers:
- Holger Kersten, Christian-Albrechts-University Kiel, Germany
B8. HiPIMS, Pulsed Plasmas and Energetic Deposition
The energy carried to the thin film during deposition is crucial in reducing the growth temperature and improving the properties of thin film materials. Higher plasma density leads to enhanced ionization of the film precursors and offers better deposition process control. This results in improved coating characteristics, valuable e.g. optical, wear-resistant, or photovoltaic applications. This session solicits contributions from academia as well as the industry which cover both the basic physics and the applications of energetic deposition. Topics of interest include but are not limited to: plasma generation and discharge physics, simulation and modelling, reactive processes and process control, mechanisms of film growth, surface and interface engineering, industrial applications and production, upscaling and associated equipment.
B8. Invited Speakers:
- Julian Held, University of Minnesota, USA, “Spokes in HiPIMS: Help or Hindrance”
- Tetsuhide Shimizu, Tokyo Metropolitan University, Japan, “Impact of Selective Acceleration of High-mass ions – Low-Temperature Growth of Stress-free Single Phase α-W Films”