Course Objectives
- Summarize main basic concepts of plasmas and sheaths
- Explain the effects of electrons and ions of various energies on surfaces
- Provide an overview of the different methods of plasma-based physical vapor deposition
- Dwell deeper for two main methods of plasma-based deposition: high power impulse magnetron sputtering (HiPIMS), and cathodic arc deposition (without and with macroparticle filtering)
- Establish the connection between plasma and film properties at the meta-level of structure zone diagrams
Course Description
This course on Physics of plasmas used in deposition processes starts by summarizing the basic properties of plasmas and plasma boundaries (sheaths). Sheaths are critically important since they determine the particle fluxes and the energy distribution functions of particles actually arriving at the substrate and growing films. Gas and metal plasmas can be generated through different types of discharges, each having advantages and disadvantages, depending on the objectives of the application. Picking two major deposition techniques, plasma-assisted magnetron sputtering (and in particular HiPIMS) and cathodic arc deposition, plasma generation, properties and ways to influence and control plasmas are discussed in detail. The relation of plasma properties and resulting coating microstructure is established using the qualitative approach of structure zone diagrams.
Who Should Attend?
Graduate students, scientists and engineers who want to learn about plasmas in deposition processes.
Instructor
André Anders
Director, Leibniz Institute of Surface Engineering
Leipzig, Germany
Professor of Applied Physics, Felix Bloch Institute
Leipzig, Germany
Editor-in-Chief, Journal of Applied Physics, AIP Publishing Melville, NY
